TOP STORY... May 7, 2009
Novellus said it has developed a dense ultralow-k and diffusion barrier stack that absorbs ultraviolet radiation from UV thermal processing steps. The UV-absorbing films protect the compressive strain that enhances device performance, Novellus said. The solution is being offered as an alternative to porous dielectric solutions.
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Friday, May 8, 2009
Novellus Rolls UV-Absorbing Dielectrics
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