Tuesday, May 19, 2009

Metrologists: Measure Twice, Process Once

TOP STORY... May 18, 2009

IBM's T.C. Chen, Alain Diebold of CNSE, and J. Alexander Liddle of NIST were among the metrology experts who spoke at the 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics. "Dimensions are approaching atomistic and quantum mechanical boundaries," said Chen, vice president of science and technology at IBM's T.J. Watson Research Center, adding that scaling already has resulted in increasing power dissipation, device variability, and degraded device and interconnect performance. 
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