FSI Adds Steam to Photoresist Clean Step

TOP STORY... March 26, 2009

FSI International has developed an all-wet cleaning process that preserves ultrashallow junctions while cleaning carbonized photoresists. Speaking at the Sematech Surface Preparation and Cleaning Conference, FSI chief technologist Jeff Butterbaugh said the photoresist stripping technique injects steam into a sulfuric peroxide mixture. "We see a significant improvement to the photoresist stripping capability by adding steam to the process," he said.
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ElectroMagnetic transmission-line metamaterials

Metamaterials are understood to be artificially engineered materials that exhibit unusual or difficult to obtain electromagnetic (EM) properties. Such properties would include negative or low values of permittivity, permeability and index of refraction. In this article, we review the fundamentals of metamaterials with emphasis on negative-refractive-index ones and which are synthesized using loaded transmission-line networks. A number of applications of such metamaterials are discussed, including peculiar lenses that can overcome the diffraction limit and small antennas for emerging wireless communication applications.

George V. Eleftheriades
Department of Electrical and Computer Engineering, University of Toronto, 10 King's College Road, Toronto, ON, M5S 3G4, CANADA

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